May 17, 2019
Ultra-clean fabrication platform produces nearly ideal 2-D transistors
Posted by Quinn Sena in categories: business, computing, engineering, particle physics
Semiconductors, which are the basic building blocks of transistors, microprocessors, lasers, and LEDs, have driven advances in computing, memory, communications, and lighting technologies since the mid-20th century. Recently discovered two-dimensional materials, which feature many superlative properties, have the potential to advance these technologies, but creating 2-D devices with both good electrical contacts and stable performance has proved challenging.
Researchers at Columbia Engineering report that they have demonstrated a nearly ideal transistor made from a two-dimensional (2-D) material stack—with only a two-atom-thick semiconducting layer—by developing a completely clean and damage-free fabrication process. Their method shows vastly improved performance compared to 2-D semiconductors fabricated with a conventional process, and could provide a scalable platform for creating ultra-clean devices in the future. The study was published today in Nature Electronics.
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